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レーザーテック(株)【6920】の掲示板 2023/03/02
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2023年3月3日 01:41
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Chipmakers use CD-SEMs (critical dimension scanning electron microscopes) to take sub-nanometer measurements of patterns once a lithography scanner transfers them from a mask to a photoresist. These measurements continuously calibrate lithography process performance to ensure the patterns are correct before they are etched into the wafer.
CD-SEMs are also used after etch to correlate intended patterns with on-wafer results. CD-SEMs thereby help control the etch process and enable a feedback loop between lithography and etch that gives engineers highly correlated data sets for holistic process tuning.
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これがその新製品ですか？
New VeritySEM® 10 system delivers industry-leading resolution and imaging speed to help chipmakers accelerate process development and maximize yield in high-volume manufacturing
SANTA CLARA, Calif., Feb. 28, 2023 (GLOBE NEWSWIRE) -- Applied Materials, Inc. today introduced a new eBeam metrology system specifically designed to precisely measure the critical dimensions of semiconductor device features patterned with EUV and emerging High-NA EUV lithography.